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PLATANEX® LUNA Platinum Electroplating Process
PLATANEX LUNA is an alkaline, high-speed, low stress, pure platinum electroplating process specifically designed to produce uniform deposits to any desired thickness. The process produces hard, ductile, matte deposits. PLATANEX LUNA is also recommended for processing electronic and other components where anti-oxidation properties in a high temperature environment are desired.
| PLATANEX LUNA |
| Type |
Platinum |
| Purity % |
99.95 |
| Color |
White |
| Hardness mHV 20 |
300 - 360 |
| Deposit Density (g/cc) |
21.4 |
| pH |
13.2 - 13.6 |
| Precious Metal Content |
20 g/l |
Deposit Time
1.0 µ (29 µin.) min.
|
3 |
| Current Density (A/ft2) |
25 |
| Hardness |
300 to 360 Vickers |
| Deposit Weight |
1.0 µ
2.5 µ
10.0 µ
10,000 µ |
2.14 mg/cm2 (13.6 mg/sq in)
5.35 mg/cm2 (33.9 mg/sq in)
21.4 mg/cm2 (135.5 mg/sq in)
21.4 g/cm2 (135.5 g/sq in) |
| Current Density (A/dm2) |
2.5 |
Plating Rate
(mg/amp-min)
|
29 |
| Time to Plate 1 Micron |
3 minutes |
| Bath Type |
Alkaline |
| Temperature |
191 - 198°F (88 - 92°C) |
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